Information

CCP Nano XP takes SCHNEIDER’s popular ONE pad technology to the compact class and offers an unmatched throughput in manual production relative to its small footprint and investment costs.

The double spindle polisher is equipped with best-in-practice technology such as its smart axis arrangement combined with the proven kinematics and spindle design of the powerful industrial CCP Modulo ONE polisher. 

Thanks to the ONE pad technology, just a single pad is enough to polish even the most strongly curved lenses up to 18dpt with ease and at premium quality. In addtion, the smart process technology and special architecture of the pad also result in higher durability and an extended pad lifetime. Ultimately, the ONE pad polishes not just the widest range but also the most lenses per tool in the market resulting in lowest cost per lens.

RFID sensors and an intelligent pad identification open up advanced options for process analysis.

The robust CCP Nano XP polisher is a great choice for many use cases: in a small manual lab, in a dedicated line for speciality jobs or as a fast lane option.

Technical Data

lens diameter

up to ∅ 92 mm

clamping system

block ∅ 43 mm

lens material

CR39, Hi-index, Polycarbonate, Trivex®

curve range

concave: 0 –  14 diopters
extended version: 0 – 18 diopters

power consumption

4 kVA avg.

air requirement

min. 6 bar (87 psi)

machine weight

approx. 415 kg (915 lb.)

dimensions (width x depth x height)

approx. 900 x 1120 x 1030 mm (35 x 44 x 41 inches)

All data subject to change without notice. Please verify details with SCHNEIDER.

Downloads